Activities
Professor Kurita’s research activities center on the development of high‑gettering‑capability silicon wafers using hydrocarbon and molecular cluster ion implantation—an area in which he holds more than 200 patents. His pioneering contributions to proximity gettering, low‑temperature annealing, and impurity control for advanced solid‑state imaging devices have been widely recognized through publications in leading journals such as IEEE JEDS, Sensors, and JJAP, as well as numerous invited presentations at international and domestic conferences.
Our research group is preparing an environment in which future graduate students and postdoctoral researchers can actively engage in experimental studies related to molecular ion implantation, advanced annealing technologies, wafer bonding, and trace impurity characterization. We aim to provide opportunities for new members to present their work at international conferences and publish in peer‑reviewed journals, supported by the group’s strong academic–industrial foundation.
Through these activities, the group fosters a collaborative and interdisciplinary research environment that integrates academic insight with industrial expertise. We are committed to welcoming motivated young researchers from around the world who wish to contribute to the advancement of next‑generation CMOS image sensor technologies and related semiconductor processes.
Our research group is preparing an environment in which future graduate students and postdoctoral researchers can actively engage in experimental studies related to molecular ion implantation, advanced annealing technologies, wafer bonding, and trace impurity characterization. We aim to provide opportunities for new members to present their work at international conferences and publish in peer‑reviewed journals, supported by the group’s strong academic–industrial foundation.
Through these activities, the group fosters a collaborative and interdisciplinary research environment that integrates academic insight with industrial expertise. We are committed to welcoming motivated young researchers from around the world who wish to contribute to the advancement of next‑generation CMOS image sensor technologies and related semiconductor processes.